Transmission Reticles and Masks


TRAM - 8892

Keywords masks, reticles, data management, substrate technology, reticle wet etching, reticle maintenance, pellicle maintenance, mask cleaning, reticle cleaning


Start Date: 01-DEC-93 / Duration: 24 months

[ contact / participants ]


Objectives and Approach

Photomask and reticles are a key enabling technology for the semiconductor industry. Clearly, any photomask defect or blemish will be replicated on the wafer, and without a perfect defect-free reticle exactly matched to the printing technology, viable advanced wafer fabrication is impossible. The prime objective of this project is to provide the necessary materials, equipments and processes required to manufacture advanced transmission photomasks and reticles, and so ensure the manufacturing viability of European semiconductor devices down to 0.35 microns scale. As such the project will relate closely with other European semiconductor development initiatives, notably the JESSI -MST Project T30, Manufacturing Science and Technology.

The principal objectives of TRAM are to:


CONTACT POINT

Mr André Hawryliw
Compugraphics International Ltd
Eastfield Industrial Estate
UK - Glenrothes KY7 4NT
tel: + 44 592 772557
fax: + 44 592 775359
telex: 72586

Participants

COMPUGRAPHICS - UK - C
SIEMENS - D - P
IMEC - B - P
MIETEC - B - P
LEICA - UK - P
HAMATECH - D - P
OXFORD - UK - A


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TRAM - 8892, December 1993


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html version of synopsis by Nick Cook