Keywords phase-shift masks, i-line steppers, 0.35 micron structures, lithography
Start Date: 15-JUN-92 / Duration: 24 months
[ contact / participants ]
After 12 months of work, the objective of JEEPS remains to investigate a wide range of factors concerning the design, specification, manufacture and use of phase-shift masks (PSMs) and their application to the production of 0.35 micron feature sizes using i-line lithography.
The main deliverables planned are:
As part of the development of a manufacturing concept, costs and turnaround time of i-line lithography in combination with PSMs will be estimated in comparison with DUV lithography without PSM techniques.
Exploitation of the results will be ensured by establishing sample manufacturing capabilities for phase shift in several places in order to supply PSM technology to industry and research institutes.
Simulation of four PSM types (cim, alternating, outrigger, chromeless) has been done. Experimental PSMs of these types have been manufactured and tested for the poly-Si and contact layers.
Rim type and alternated (400 included in the project) PSMs have been selected for further investigations, chromeless PSMs have been dropped, as they produce only marginal performance benefits over conventional masks.
Intensive mask has been carried out in the field of mask qualification and repair.
Dr André Hawryliw
Compugraphics International Ltd
Eastfield Industrial Estate
UK - Glenrothes KY7 4NT
tel: + 49 / 592-772557
fax: + 49 / 592-775359
COMPUGRAPHICS INTERNATIONAL LTD - UK - C
DU PONT PHOTOMASKS GMBH + CO.KG - D - P
CENTRE NATIONAL D'ETUDES
DE TELECOMMUNICATIONS - F - P
FRAUNHOFER GESELLSCHAFT (IFT
JEEPS - 6908, December 1993
please address enquiries to the ESPRIT Information Desk
html version of synopsis by Nick Cook