MST - 5081
Keywords VLSI manufacturing, wafer fabrication, process integration, cleanroom technology, masks
Start Date: 01-JUN-90 / Duration: 18 months
[ contact / participants ]
Objectives and Approach
The objective of this project was to develop concepts and to realise practical solutions to enable efficient and cost-effective manufacturing to be carried out with respect to yield, cycle time, flexibility of products and processes, equipment utilisation and labour productivity. Traditional manufacturing technology, as well as advanced production methods, will be addressed with the aim of mastering the situation in the production environment for standard IC high-volume manufacturing, and for custom or semi-custom ICs with quick turnaround manufacturing requirements.
The project focused on the following four topics:
- Equipment Engineering
- Equipment selection and cooperation with suppliers, preferably on a European basis. Strategic decision making for new equipment installation, modifications and improvements. In-time acquisition of manufacturing experience on equipment for larger wafer sizes. Investigation of the potential for cost reduction by: design; dimensions and materials of equipment; particle reduction by surface finish; availability improvement by real time process control; self-diagnostics; lot and wafer traceability.
- Automation and Integration
- Material flow and management system for high product mix and varying lot sizes. CAM and network hierarchy. Flexible manufacturing cells. Communication interfaces. Modelling of manufacturing figures of merit, ie influences of rework, microprocessing, equipment idle time, equipment reliability, awareness of cycle time, inventory, and capacity of manufacturing lines. Investigations on optimised operator time utilisation in a fab environment.
- Optimisation of the total manufacturing environment through manufacturing design (theoretical throughput time, fab layout, process mix, lot sizes, wafer size, simulation tools). Investigation and optimisation of manufacturing efficiency (productivity improvement, cost reduction), equipment utilisation, people utilisation, rework reduction, WIP management.
- Cleanroom Technology
- Total isolation of materials (wafer, dice) from operators. Clean-room design, material selection, air-flow control for particle control. Detection of ultra-small particles. Analysis of airborne, sticking and liquid-suspended particles. Improvement of existing facility monitoring systems. Measures for the minimisation of outgoing process media, heat and power dissipation, environmental protection.
- Waste management, including specifications for cleaning techniques, installations, and equipment.
- Mask Making
- Mask technology for quick turnaround IC production: CAM including mask and reticle identification for mask, process and lot allocation, mask process automation and statistical process control (SPC), high-precision mask repair for clear and opaque defects, pellicle technology, improvement of materials for advanced exposure techniques, and mask-cleaning technology. Automated mask and reticle management and storage.
Work has started with 1.0/0.7 micron technology requirements (during the start-up phase) and aims to ultimately address 0.5/0.3 micron manufacturing requirements.
Progress and Results
During the start-up phase, the consortium successfully addressed about 400 individual manufacturing problems for the optimisation of production in the topics mentioned above. The main objectives were to optimise 1.0 micron processing and define manufacturing requirements for 0.5 micron processes, both of which have been achieved. The main phase of the project, focusing on 0.7/0.5 micron production, has now been launched (see project 7365, MST).
Mr J. Griessing
D - 8000 MÜNCHEN 80
tel: + 49/ 89-4144 8382
fax: + 49/ 89-4144 8002
SIEMENS AG - D - C
ES2 SA - F - P
MIETEC NV - B - P
PLESSEY UK LTD - UK - P
STM-SGS-THOMSON MICROELECTRONICS SRL - I - P
TELEFUNKEN ELECTRONIK GMBH - D - P
SGS-THOMSON MICROELECTRONICS SA - F - P
PHILIPS INTERNATIONAL BV - NL - P
MATRA-MHS - F - P
MST - 5081, December 1993
please address enquiries to the ESPRIT Information Desk
html version of synopsis by Nick Cook