High Precision, Automated CD Metrology Station


METRICS - 5026

Keywords critical dimension measuring tools, metrology, field emission guns, electron optics


Start Date: 01-JAN-90 / Duration: 18 months

[ contact / participants ]


Objectives and Approach

The goal of the METRICS project was to tackle the major risk elements in the development of a critical dimension (CD) measuring tool, based on electron optics, for the sub-half micron regime.

Progress and Results

In the course of the project, all those elements identified as having significant risk have been addressed and suitable solutions developed. Involving four research institutes, three user groups and two instruments companies, the project team has made significant breakthroughs and incremental performance improvements relative to today's technology.

The following elements have been successfully demonstrated.

These achievements will be consolidated into a metrology system that will satisfy the needs of the industry for sub-half micron metrology. However, a number of the project deliverables will be commercialised from their current form.

Exploitation

Commercialisation already includes:


CONTACT POINT

Mr H. Tolner
NEDERLANDSE PHILIPS BEDRIJVEN BV
Building AAE-P, PO Box 218
NL - 5600 MD EINDHOVEN
tel: + 31/ 40-766223
fax: + 31/ 40-766164
telex: 35000

Participants

NEDERLANDSE PHILIPS BEDRIJVEN BV - NL - C
INTEGRATED CIRCUIT TESTING GMBH - D - P
NEDERLANDSE PHILIPS BEDRIJVEN BV - NL - P
RUTHERFORD APPLETON LABORATORY - UK - P
IMEC VZW - B - A
SGS-THOMSON MICROELECTRONICS SRL - I - A
UNIVERSITY OF EDINBURGH - UK - A
SIEMENS AG / SEMICONDUCTOR GROUP - D - A
NEDERLANDSE PHILIPS BEDRIJVEN BV - NL - A


TCS synopses home page TCS acronym index TCS number index
All synopses home page all acronyms index all numbers index

METRICS - 5026, December 1993


please address enquiries to the ESPRIT Information Desk

html version of synopsis by Nick Cook